Helium Ion Microscopy with ZEISS ORION NanoFab

April 11, 2016 ZEISS Microscopy

Gas Field Ion Imaging and Nanofabrication – a Reference List

Gas field ion beam microscopy has been in use since 2007 for applications which require damage free imaging of nanometer features or more recently for nanofabrication of sub-10 nm structures. ZEISS ORION NanoFab is the only helium and neon focused ion beam system in the world. There are over 400 publications for applications including biological materials, nanomaterials, semiconductor structures, such as direct write lithography, nanopore milling, graphene imaging and structuring, high temperature superconductor fabrication, plasmonic device structuring, and circuit editing and analysis.

Gas helium or neon is ionized at an atomically sharp metal tip and emits as ions from a ‘trimer’. The ions are focused through electrostatic optics in an ion column, which is part of the ZEISS ORION NanoFab system.
Gas helium or neon is ionized at an atomically sharp metal tip and emits as ions from a ‘trimer’. The ions are focused through electrostatic optics in an ion column, which is part of the ZEISS ORION NanoFab system.

The figure shows a schematic of a gas field ion source ‘trimer’ and the electrostatic optics which create a focused helium or neon gas field ion beam. The column is coupled with a high vacuum system into which samples are inserted. Advantages include low damage imaging, surface structure detail, sub-10 nm milling, and the ability to produce ultra-high resolution images of non conductive surfaces.

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A new Application Note details the published research using ZEISS ORION NanoFab over the past years. This reference list shows the vast opportunities of a multi-purpose Helium ion microscope within different areas of research. These include scientific publications in biology, nanomaterials, semiconductors, nanopatterning, instrument science, nanoplasmonics, and graphene research.

Download the Application Note with reference list here!

Don’t miss the 1st International Conference on Helium Ion Microscopy and Emerging Focused Ion Beam Technologies (HEFIB 2016) which will be held from 8 to 10 June 2016 in Luxembourg City

Eager to know how ORION NanoFab can boost your research? Visit the website and get in contact with our specialists!

 

Further reading:

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